Ceramic wafer carriers feature excellent thermal resistance, chemical stability, and dimensional accuracy, making them ideal for wafer support, heating, cooling, and process platform applications. High-purity alumina is finely polished to ensure low particle generation, corrosion resistance, and stable thermal performance, suitable for CMP, etching, cleaning, and other critical semiconductor processes.

陶瓷载盘具有优异的耐热性、化学稳定性与尺寸精度，可用于晶圆承载、加热、冷却与工艺平台支撑。高纯氧化铝经过精密抛光处理，确保低颗粒释放、耐腐蚀与稳定的热性能，适用于CMP、刻蚀、清洗等多种关键制程。